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@article{JPA3908, author = {Karl Cedric P. Gonzales and Karim M. Omambac and Elizabeth Ann P. Prieto and Jessica Pauline C. Afalla and Maria Herminia M. Balgos and Rafael B. Jaculbia and Armando S. Somintac and Arnel A. Salvador and Elmer S. Estacio}, title = {Terahertz Emission of Gallium Arsenide on Textured p-type Silicon (100) Substrates Grown via Molecular Beam Epitaxy}, journal = {Journal of Physics and Its Applications}, volume = {1}, number = {1}, year = {2018}, keywords = {GaAs on Si;Molecular Beam Epitaxy;Terahertz;Surface Texturing}, abstract = {This study presents the terahertz (THz) emission of molecular beam epitaxy (MBE)-grown Gallium Arsenide (GaAs) on surface textured p-type Silicon (p- Si) (100) substrates. Surface texturing was achieved by anisotropic wet chemical etching using 5% wt Potassium Hydroxide (KOH): Isopropyl alcohol (IPA) (50:1) solution for 15, 30, 45, and 60 minutes. Reflectivity measurements for the textured p-Si(100) substrates indicated that the overall texturing increases with longer etching times. Raman spectroscopy of the post-growth samples confirmed GaAs growth. The THz emission intensities were the same order of magnitude. The GaAs grown on p-Si(100) textured for 60 minutes exhibited the most intense THz emission attributed to the increased absorption from a larger surface-to-volume ratio due to surface texturing. All GaAs on textured p-Si(100) samples had frequency bandwidth of ~2.5 THz.}, issn = {2622-5956}, pages = {7--9} doi = {10.14710/jpa.v1i1.3908}, url = {https://ejournal2.undip.ac.id/index.php/jpa/article/view/3908} }
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